Patent Ranking in Japan - Applicant details - Japanese version

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エーエスエムエル ネザーランズ ビー.ブイ.

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  2014 Application Ranking      521th  publications: 66 下降2013: 306th  142)

  2014 Acquisition Ranking      203th  registrations: 208 下降2013: 137th  291)

(update:Feb 25, 2021)

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公報番号発明の名称公報発行日備考
特開 2014-241425 Lithograph device Dec 25, 2014
特開 2014-241411 Optical element mount for lithographic equipment Dec 25, 2014
特表 2014-534620 Chuck, lithographic equipment and method of using chuck Dec 18, 2014
特表 2014-534559 Radiation source Dec 18, 2014
特表 2014-534646 Lithography equipment, device manufacturing methods and computer programs Dec 18, 2014
特表 2014-533420 Radiation source devices, lithography equipment, and device manufacturing methods Dec 11, 2014
特開 2014-225669 Substrate holder, lithography equipment, device manufacturing method, and substrate holder manufacturing method Dec 4, 2014
特表 2014-531704 Radiation source Nov 27, 2014
特表 2014-531705 Radiation sources, methods for lithographic equipment, and device manufacturing methods Nov 27, 2014
特表 2014-531743 Energy sensor for optical beam alignment Nov 27, 2014
特表 2014-531767 How to Provide a Patterned Orientation Template for Self-Assembling Polymers Nov 27, 2014
特表 2014-531131 Lithography equipment and methods Nov 20, 2014
特表 2014-529896 Metrology method and equipment and device manufacturing method Nov 13, 2014
特表 2014-529901 Lithography equipment, lithographic equipment setup method, and device manufacturing method Nov 13, 2014
特表 2014-529862 Radiation source and lithography equipment Nov 13, 2014

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2014-241425 2014-241411 2014-534620 2014-534559 2014-534646 2014-533420 2014-225669 2014-531704 2014-531705 2014-531743 2014-531767 2014-531131 2014-529896 2014-529901 2014-529862

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Patent Ranking in Japan

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